By Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
ISBN-10: 0128103566
ISBN-13: 9780128103562
ISBN-10: 1437778593
ISBN-13: 9781437778595
CMP and sharpening are the main specific methods used to complete the surfaces of mechanical and digital or semiconductor elements. Advances in CMP/Polishing applied sciences for Manufacture of digital units provides the most recent advancements and technological concepts within the box – making state of the art R&D available to the broader engineering neighborhood.
Most of the functions of those methods are stored as exclusive as attainable (proprietary information), and particular information usually are not obvious in specialist or technical journals and magazines. This publication makes those methods and purposes obtainable to a much broader commercial and educational audience.
Building at the basics of tribology – the technological know-how of friction, put on and lubrication – the authors discover the sensible functions of CMP and sprucing throughout quite a few marketplace sectors. as a result of excessive velocity of improvement of the electronics and semiconductors undefined, some of the provided strategies and purposes come from those industries.
- Demystifies clinical advancements and technological options, starting them up for brand new functions and procedure advancements within the semiconductor and different parts of precision engineering
- Explores inventory elimination mechanisms in CMP and sprucing, and the demanding situations keen on predicting the results of abrasive strategies in high-precision environments
- The authors compile the newest techniques and learn from the us and Japan
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Advances in CMP Polishing Technologies by Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
by Joseph
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